In the wafer processing system, the plasma can be generated inside a vacuum chamber by applying RF field to a specific gas. In order to perform physical vapor deposition (PVD) uniformly onto the wafer, RF coils are used to create a uniform electric field. However, it’s difficult to tune and measure the coil performance. Engineers can only run the device and wait to check the wafer, which is very time consuming. Simulation will help you to model the RF coil inside the chamber and tune the performance.

During the webinar, we will demonstrate RF coil with vacuum chamber setup in ANSYS Electronic Desktop, and simulating the coil to extract EM field to check the uniformity.